F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters
Paper
Thermally stable ultra-thin Zr silicate for CMOS applications
Abstract
The electrical and physical properties of ultra-thin zirconium silicate films deposited by the jet-vapor-deposition (JVD) process were reported. The fabrication of the films with equivalent oxide thickness of 1 nm with high thermal stability, low leakage and good electrical properties was shown. It was shown that zirconium silicate films can survive an annealing temperature as high as 1000°C.
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