R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics
Thin film deposition with physical vapor deposition (PVD) and related technology was studied. Variations of PVD processes include thermal evaporation, physical sputtering, laser ablation and arc-based emission. The modifications included reactive sputter deposition, the unbalanced magnetron, collimated and ionized sputter deposition.
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics
Robert W. Keyes
Physical Review B
Sung Ho Kim, Oun-Ho Park, et al.
Small
L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993