Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting
Thin film deposition with physical vapor deposition (PVD) and related technology was studied. Variations of PVD processes include thermal evaporation, physical sputtering, laser ablation and arc-based emission. The modifications included reactive sputter deposition, the unbalanced magnetron, collimated and ionized sputter deposition.
Min Yang, Jeremy Schaub, et al.
Technical Digest-International Electron Devices Meeting
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997
L.K. Wang, A. Acovic, et al.
MRS Spring Meeting 1993
Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry