Effect of ion bombardment during deposition on the x-ray microstructure of thin silver filmsT.C. HuangG. Limet al.1985JVSTA
Summary Abstract: The origin of oxidation induced enhancement of Si+ sputter yield in SIMSD.J. VitkavageJ.G. Clabeset al.1985JVSTA
Summary Abstract: Microstructure and electrical conductivity of plasma deposited gold/fluorocarbon composite filmsJ. PerrinB. Despaxet al.1985JVSTA
Effects of biased cosputtering on resistivity and step coverage in tungsten silicide filmsK.W. ChoiK.Y. Ahn1985JVSTA