PREVAIL: Operation of the electron optics proof-of-concept system
- M. Gordon
- J.E. Lieberman
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Publications
168 results at Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
High emittance source for the PREVAIL projection lithography system
- S.D. Golladay
- R.A. Kendall
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Characteristics of chemical vapor deposition diamond films for x-ray mask substrates
- Cameron J. Brooks
- Lynn A. Powers
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Deep-ultraviolet interferometric lithography as a tool for assessment nf chemically amplified photoresist performance
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Light-coupling masks: An alternative, lensless approach to high-resolution optical contact lithography
- Heinz Schmid
- Hans Biebuyck
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Current oscillations in thin metal-oxide-semiconductor structures observed by ballistic electron emission microscopy
- H.J. Wen
- R. Ludeke
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Chemically amplified resist processing with top coats for deep-ultraviolet and e-beam applications
- Karen Petrillo
- James Bucchignano
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Interaction between gas rarefaction and metal ionization in ionized physical vapor deposition
- S.M. Rossnagel
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Accuracy and efficiency in electron beam proximity effect correction
- S.J. Wind
- P.D. Gerber
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Challenges and progress in x-ray lithography
- Jerome P. Silverman
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures