Test of structural models for Ag{110}1 2-0 by LEED intensity analysisE. ZanazziM. Magliettaet al.1983JVSTA
Summary Abstract: Cluster formation and the percolation threshold in thin Au filmsR.B. LaibowitzE.I. Alessandriniet al.1983JVSTA
Chemical bonding and Schottky barrier formation at transition metal-silicon interfacesPaul S. Ho1983JVSTA
Summary Abstract: Crystallographic structure of coevaporated Ni-Al alloy filmsH.T.G. HentzellB. Anderssonet al.1983JVSTA
Importance of chain reactions in the plasma deposition of hydrogenated amorphous siliconIvan Haller1983JVSTA
Chemical bonding and reactions at Ti/Si and Ti/oxygen/Si interfacesR. BlitzG.W. Rubloffet al.1983JVSTA
Correlation between the ion bombardment during film growth of Pd films and their structural and electrical propertiesP. ZiemannE. Kay1983JVSTA
Summary Abstract: Developments in broad-beam ion source technology and applicationsH.R. KaufmanJ.J. Cuomo1983JVSTA