Cobalt/copper composite interconnects for line resistance reduction in both fine and wide linesTakeshi NogamiRaghuveer Patlollaet al.2017IITC 2017
Methods to lower the resistivity of ruthenium interconnects at 7 nm node and beyondXunyuan ZhangHuai Huanget al.2017IITC 2017
Planarity considerations in SADP for advanced BEOL patterningJames H.-C. ChenTerry A. Spooneret al.2017IITC 2017