Publications

20 results at SPIE Advanced Lithography 2011

Systematic studies on reactive ion etch-induced deformations of organic underlayers
- - Martin Glodde
  - Sebastian Engelmann
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Fundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
- - Guillaume Landie
  - Yongan Xu
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Self-assembly patterning for sub-15nm half-pitch: A transition from lab to fab
- - Chris Bencher
  - Jeffrey Smith
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Bound PAG resists: An EUV and electron beam lithography performance comparison of fluoropolymers
- - Luisa D. Bozano
  - Phillip J. Brock
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Revisit pattern collapse for 14nm node and beyond
- - Kenji Yoshimoto
  - Craig Higgins
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Visualization of the develop process
- - Linda K. Sundberg
  - Gregory M. Wallraff
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Hexafluoroalcohol (HFA) containing molecular resist materials for high resolution lithographic applications
- - Anuja De Silva
  - Linda K. Sundberg
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Critical challenges for "non-critical" layers
- - J.M. Gomez
  - I.Y. Popova
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Single exposure contacts are dead. Long live single exposure contacts!
- - Henning Haffner
  - Martin Ostermayr
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Integrated model-based retargeting and optical proximity correction
- - Kanak B. Agarwal
  - Shayak Banerjee
- 2011
- SPIE Advanced Lithography 2011