Chemical amplification in the design of dry developing resist materials
- Hiroshi Ito
- C. Grant Willson
- 2004
- Polymer Engineering & Science
Publications
45 results at Polymer Engineering & Science
Electron beam processing systems (a state of the art review)
- M. Hatzakis
- 2004
- Polymer Engineering & Science
Parameters, affecting the sensitivity of poly(methyl methacrylate) as a positive lithographic resist
- Edward Gipstein
- Augustus C. Ouano
- et al.
- 2004
- Polymer Engineering & Science
X‐ray lithography
- R. Feder
- E. Spiller
- et al.
- 2004
- Polymer Engineering & Science
Dissolution dynamics of some polymers: Solvent‐polymer boundaries
- A.C. Ouano
- J.A. Carothers
- 2004
- Polymer Engineering & Science
Photochemical free‐volume generation in poly(methyl methacrylate) photoresists
- William Limm
- Mitchell A. Winnik
- et al.
- 2004
- Polymer Engineering & Science
Recent advances in the photodecomposition mechanisms of diazo‐oxides
- J. Pacansky
- 2004
- Polymer Engineering & Science
Physical properties of polymers–an introductory discussion
- Thor L. Smith
- 2004
- Polymer Engineering & Science
Concerning voids in polyimide
- T.P. Russell
- 2004
- Polymer Engineering & Science
A study on the dissolution rate of irradiated poly(methyl methacrylate)
- A.C. Ouano
- 2004
- Polymer Engineering & Science