Novel Polymeric Dissolution Inhibitor for the Design of Sensitive, Dry Etch Resistant, Base-Developable Resist
- Hiroshi Ito
- Elizabeth Flores
- et al.
- 2019
- JES
Publications
509 results at JES
Migration Considerations in Chronopotentiometric Analysis
- Huk Y. Cheh
- 2019
- JES
PtSi-Induced Junction Leakage
- J.P. Gambino
- M.D. Monkowski
- et al.
- 2019
- JES
Etch Selectivity of Silicon Dioxide over Titanium Silicide Using CF4/H2 Reactive Ion Etching
- Steve W. Robey
- Gottlieb S. Oehrlein
- 2019
- JES
Surface Modifications of Electronic Materials Induced by Plasma Etching
- G.S. Oehrlein
- S.W. Robey
- et al.
- 2019
- JES
Pit Growth in Nife Thin Films
- B.M. Rush
- J. Dukovic
- et al.
- 2019
- JES
Application of Chemical and Electrochemical Micromachining in the Electronics Industry
- Madhav Datta
- Lubomyr T. Romankiw
- 2019
- JES
Monitoring the Growth of an Oxide Film on Aluminum In Situ with the Quartz Crystal Microbalance
- Owen R. Melroy
- 2019
- JES
High temperature process limitation on TiSi2
- C.-Y. Ting
- F.M. d'Heurle
- et al.
- 2019
- JES
MnFe and NiFe Thin Films and Magnetic Exchange Bilayers
- Michael A. Russak
- S.M. Rossnagel
- et al.
- 2019
- JES