On the Role of Buffers and Anions in NiFe Electrodeposition
- Jean Horkans
- 2019
- JES
Publications
509 results at JES
Etching Silicon with Fluorine Gas
- M. Chen
- V.J. Minkiewicz
- et al.
- 2019
- JES
The Etching of Crystallographically Determined Orifices in Sapphire
- A. Reisman
- M. Berkenblit
- et al.
- 2019
- JES
II. Oxidation of Al Films
- Jean Grimblot
- Jerome M. Eldridge
- 2019
- JES
On Fitting Error Functions to Data
- R. Ghez
- M.B. Small
- 2019
- JES
Preparation and Some Properties of Chemically Vapor-Deposited Si-Rich SiO and Si3N4 Films
- D.W. Dong
- E.A. Irene
- et al.
- 2019
- JES
The Formation of SiO2 in an RF Generated Oxygen Plasma: II. The Pressure Range Above 10 mTorr
- A. Ray
- A. Reisman
- 2019
- JES
Properties of AI2O3 Films Deposited from the AICI3, CO2, and H2 System
- V.J. Silvestri
- C.M. Osburn
- et al.
- 2019
- JES
On the Nature of Fixed Oxide Charge
- S.I. Raider
- A. Berman
- 2019
- JES
Plasma Oxide FET Devices
- A. Ray
- A. Reisman
- 2019
- JES