Publications

2 results at DRC 2025

Effect of Capping Layer Under Forming Gas Anneal for Back-End-of-Line Oxide Semiconductor FETs
- - Saketh Ram Mamidala
  - Antonio La Porta
  - et al.
- 2025
- DRC 2025
Innovative BEOL Oxide-Based Devices as Key Enablers for High-Performing Heterogeneous Systems
- - Valeria Bragaglia
  - Wooseok Choi
  - et al.
- 2025
- DRC 2025