Ph.D. Electrical Engineering, Yale University, 2007
M.Phil. Electrical Engineering, Yale University, 2005
B.S. Microelectronics, Peking University, 2002
Technology Definition: Density and Performance
Device Design and Process Integration
Material & Process: High-K/Metal Gate, Channel Material Innovation, Contact Resistivity Reduction.
Novel Device Architecture: FINFET, Nanosheet,
Memory & New Computing Devices