Professional AssociationsProfessional Associations: SPIE -- International Society of Optical Engineering
Hoa D. Truong , a native of Vietnam, graduated in chemical engineering at Case Western Reserve University. She joined IBM in 1998 and works as a lithography engineer at the IBM Almaden Research Center in San Jose, California. She has worked on resists formulations, characterizations and process optimizations of advanced patterning materials for 193 nm, Ebeam and EUV applications. Currently she is also working on pre-patterning of positive/negative resists by 193 nm immersion lithography for directed self-assembly (DSA).