Krystelle Lionti is currently a Research Staff Member at IBM Almaden Research Center (San Jose, CA) working on the development of an electronic nose targeting AI applications, as well as on additive lithography processes to impact IBM's semiconductor pathfinding research.
Krystelle pursued her graduate studies at INSA (Lyon, France) and obtained her Master's Degree in Materials Science in 2009. In 2012, she obtained her PhD degree in Inorganic Chemistry from the University of Lyon (France) where she developed hybrid Organic/Inorganic silica coatings via the sol-gel route on polymeric substrates for protection purposes. Her expertise in thin film preparation and characterization subsequently brought her to the Hybrid Polymeric Materials group of IBM ARC in 2013 where she worked on the characterization and protection of porous organosilicate thin films (ULK materials) for their damage free integration in microelectronics BEOL processes. In 2017, Krystelle moved on to the development of novel chemiresistive materials to be included in an IoT device (so-called electronic nose) for the detection and/or monitoring of VOCs. Since 2020, she has also been working on improving Area Selective Deposition processes for a wide range of microelectronics applications.
Krystelle also has interests in Quantum Computing that she studies on her spare time.