Mary is a metrology engineer within IBM Semiconductor Technology Research at the Albany location. While heavily involved in inline CDSEM research and development projects, she also has some projects exploring inline scatterometry capabilities and other metrologies. Design-based metrology and macro design are areas where Mary also spends a good portion of her time.
On the side, Mary is the chair of the IBM site's New Hire Network, to faciliate new hire professional and social integration to this unique IBM environment. Mary is involved with MIT & RPI recruiting for IBM, as well as pubbing cool things that Research works on through the Semiconductor site and social media!
Mary's Bachelor of Science degree (S.B.) is from Massachusetts Institute of Technology (MIT) from the Department of Materials Science and Engineering (DMSE). She received her Masters of Engineering (M.Eng) from Rensselaer Polytechnic Institute's (RPI's) Materials Science and Engineering (MSE) Department in 2017 and researched under Dr. Robert Hull. She was a summer metrology intern at IBM's East Fishkill site developing an algorithm to reduce model build time for scatterometry projects before joining IBM full-time.