I received my B.S. degree from the University of Maryland at College Park, and M.S. degree from Stanford University, both in Chemical Engineering. I joined IBM’s General Products Division in 1982, first as a process engineer in disk manufacturing and later worked in failure analysis. I transferred to IBM’s Research Division in 1989 and worked on process development and characterization of low dielectric polymers. I then worked on fundamental studies of photoresists for extendibility to sub-100 nm scale dimensions. This work stimulated awareness in the industry of resist resolution limitations and parameters affecting LER (line edge roughness). Currently, I am working on development of e-beam and next-generation photoresists.
My interests are in polymer processing and material characterization of polymers using optical and nonoptical microscopy, such as Scanning Electron Microscopy and Atomic Force Microscopy, and spectroscopic techniques including Infrared Spectroscopy. I am co-author of approximately 70 publications and 4 patents, and co-authored a book chapter in Applied Scanning Probe Methods. Honors received include the Arthur K. Doolittle Award from the American Chemical Society (1992), and several IBM recognition awards. I chaired the 2016 and 2017 SPIE Advanced Lithography Symposium's Metrology, Inspection, and Process Control for Microlithograpy Conference and the 2016 Lithography Workshop.
Outside of work, I visit classrooms to encourage kids to continue taking math and science by doing hands-on demos. I have been an AYSO soccer commissioner for 13 years.