Praveen Joseph  Praveen Joseph photo         

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AI Hardware Center
Thomas J. Watson Research Center, Yorktown Heights, NY, USA
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2020

A comparative analysis of EUV sheet and gate patterning for beyond 7nm gate all around stacked nanosheet FETs
Indira Seshadri, Praveen Joseph, Stuart A. Sieg, Tao Li, Wenyu Xu, Eric Miller, Dan J. Dechene, Andrew Greene, Carl Radens, Jingyun Zhang, Yann Mignot, Pietro Montanini, Mary Breton, Veeraraghavan Basker, Nelson Felix
SPIE Advanced Lithography, 2020, San Jose, California, United States

Nanoscale limits of angular optical scatterometry
Ruichao Zhu, Juan J. Faria-Briceno, Steven R. J. Brueck, Praveen Joseph, Shrawan Singhal, S. V. Sreenivasan
AIP Advances 10(015140), 1-10, 2020


2019

Full Bottom Dielectric Isolation to Enable Stacked Nanosheet Transistor for Low Power and High Performance Applications
J. Zhang, S. Pancharatnam, C. Adams, H. Wu, H. Zhou, T. Shen, R. Xie, M. Sankarapandian, J. Wang, K. Watanabe, R. Bao, J. Frougier, X. Liu, C. Park, H. Shobha, P. Joseph, D. Kong, A. Arceo De La Pena, J. Li, R. Conti, D. Dechene, N. Loubet, A. Greene, R. Chao, T. Yamashita, R. Robison, V. Basker, K. Zhao, D. Guo, B. Haran, R. Divakaruni, H. Bu, X. Miao, L. Yu, R. Vega, P. Montanini, C. Durfee, A. Gaul
2019 IEEE International Electron Devices Meeting (IEDM)


2017

Fabrication of self-aligned multilevel nanostructures
Praveen Joseph, Shrawan Singhal, Ovadia Abed, S.V. Sreenivasan
Microelectronic Engineering 169, 49-61, 2017


2016

Scatterometry for nanoimprint lithography
Ruichao Zhu, Steven R. J. Brueck, Noel Dawson, Tito Busani, Praveen Joseph, Shrawan Singhal, S. V. Sreenivasan
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 34(6), 2016