Daniel P (Dan) Sanders  Daniel P (Dan) Sanders photo         

contact information

Manager - Electronic Materials and Accelerated Materials Discovery
Almaden Research Center, San Jose, CA, USA
  +1dash408dash927dash2604

links

Professional Associations

Professional Associations:  American Chemical Society


2019

Model reactivity of inorganic and organometallic materials in EUV (Conference Presentation)
Wyatt Thornley, Hoa D. Truong, Martha I. Sanchez, Daniel P. Sanders, Gregory M. Wallraff, Oleg Kostko, D. Frank Ogletree, Daniel S. Slaughter
Advances in Patterning Materials and Processes XXXVI10960, 2019
Abstract   semiconductor, resist, raman spectroscopy, photoresist, nanotechnology, materials science, ligand field theory, infrared, group 2 organometallic chemistry, extreme ultraviolet lithography


2017

Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle
Chi, Cheng and Liu, Chi-Chun and Meli, Luciana and Guo, Jing and Parnell, Doni and Mignot, Yann and Schmidt, Kristin and Sanchez, Martha and Farrell, Richard and Singh, Lovejeet and others
SPIE Advanced Lithography, pp. 101460Q--101460Q, 2017
Abstract

Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design?
Lai, Kafai and Liu, Chi-Chun and Tsai, Hsinyu and Xu, Yongan and Chi, Cheng and Raghunathan, Ananthan and Dhagat, Parul and Hu, Lin and Park, Oseo and Jung, Sunggon and others
Journal of Micro/Nanolithography, MEMS, and MOEMS 16(1), 013502--013502, International Society for Optics and Photonics, 2017
Abstract


2016

Strategies to enable directed self-assembly contact hole shrink for tight pitches
Kristin Schmidt, Hitoshi Osaki, Kota Nishino, Martha Sanchez, Chi-Chun Liu, Tsuyoshi Furukawa, Cheng Chi, Jed Pitera, Nelson Felix, Daniel Sanders
Alternative Lithographic Technologies VIII9777, 2016
Abstract   physics, nanotechnology, integrated circuit, directed self assembly, contact hole

Synthesis and Thin-film Self-assembly of Cylinder-Forming High- Block Copolymers
Ankit Vora, Gabriela Alva, Anindarupa Chunder, Kristin Schmidt, Teddie Magbitang, Elizabeth Lofano, Noel Arellano, Joy Cheng, Daniel P. Sanders
Journal of Photopolymer Science and Technology 29(5), 685-688, 2016
thin film, self assembly, ring opening polymerization, polymer chemistry, organic chemistry, materials science, cylinder, copolymer

Contrast enhanced diffusion NMR: quantifying impurities in block copolymers for DSA
Rudy Wojtecki, Ellie Porath, Ankit Vora, Alshakim Nelson, Daniel Sanders
Advances in Patterning Materials and Processes XXXIII9779, 2016
Abstract   thin film, polymer characterization, polymer, physics, optics, nanotechnology, nanometre, micelle, methyl methacrylate, impurity, copolymer, chemical engineering

DSA via hole shrink for advanced node applications
Cheng Chi, Chi-Chun Liu, Luciana Meli, Kristin Schmidt, Yongan Xu, Ekmini Anuja DeSilva, Martha Sanchez, Richard Farrell, Hongyun Cottle, Daiji Kawamura, Lovejeet Singh, Tsuyoshi Furukawa, Kafai Lai, Jed W. Pitera, Daniel Sanders, David R. Hetzer, Andrew Metz, Nelson Felix, John Arnold, Matthew Colburn
Alternative Lithographic Technologies VIII9777, 2016
Abstract   trench, topology, superposition principle, semiconductor device fabrication, physics, optics, nanotechnology, multiple patterning, monte carlo method, lithography, global positioning system, cylinder

Development of polycarbonate-containing block copolymers for thin film self-assembly applications
Ankit Vora, Rudy J. Wojtecki, Kristin Schmidt, Anindarupa Chunder, Joy Y. Cheng, Alshakim Nelson, Daniel P. Sanders
Polymer Chemistry 7(4), 940-950, 2016
Abstract   trimethylene carbonate, thin film, self assembly, ring opening polymerization, polystyrene, polycarbonate, organic chemistry, gel permeation chromatography, copolymer, chemistry

DSA patterning options for FinFET formation at 7nm node
Liu, Chi-Chun C and Franke, Elliott and Lie, Fee Li and Sieg, Stuart and Tsai, Hsinyu and Lai, Kafai and Truong, Hoa and Farrell, Richard and Somervell, Mark and Sanders, Daniel and others
SPIE Advanced Lithography, pp. 97770R--97770R, 2016
Abstract

High chi block copolymer DSA to improve pattern quality for FinFET device fabrication
Tsai, Hsinyu and Miyazoe, Hiroyuki and Vora, Ankit and Magbitang, Teddie and Arellano, Noel and Liu, Chi-Chun and Maher, Michael J and Durand, William J and Dawes, Simon J and Bucchignano, James J and others
SPIE Advanced Lithography, pp. 977910--977910, 2016
Abstract

Nanoscale chemical imaging by photoinduced force microscopy
Derek Nowak, William Morrison, H. K. Wickramasinghe, Junghoon Jahng, Eric Potma, Lei Wan, Ricardo Ruiz, Thomas Albrecht, Kristin Schmidt, Jane Frommer, Daniel Sanders, Sung Park
Science Advances 2(3), e1501571, 2016
Abstract


2015

Interfacial layers with photoswitching surface energy for block copolymer alignment and directed self-assembly
Michael J. Maher, Christopher M. Bates, William J. Durand, Gregory Blachut, Dustin W. Janes, Joy Y. Cheng, Daniel P. Sanders, C. Grant Willson, Christopher J. Ellison
Journal of Photopolymer Science and Technology 28(5), 611-615, 2015
surface energy, organic chemistry, materials science, directed self assembly, copolymer

Synthesis and Characterization of Polycarbonate-containing All-organic High- Block Copolymers for Directed Self-assembly
Ankit Vora, Anindarupa Chunder, Melia Tjio, Teddie Magbitang, Elizabeth Lofano, Noel Arellano, Kristin Schmidt, Khanh Nguyen, Joy Cheng, Daniel P. Sanders
Journal of Photopolymer Science and Technology 28(5), 659-662, 2015
self assembly, ring opening polymerization, polymer chemistry, polycarbonate, organic chemistry, materials science, copolymer

Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch
Tsai, HsinYu and Miyazoe, Hiroyuki and Cheng, Joy and Brink, Markus and Dawes, Simon and Klaus, David and Bucchignano, James and Sanders, Daniel and Joseph, Eric and Colburn, Matthew and others
SPIE Advanced Lithography, pp. 942314--942314, 2015
Abstract

Directed self-assembly of topcoat-free, integration-friendly high-X block copolymers
Eri Hirahara, Margareta Paunescu, Orest Polishchuk, EunJeong Jeong, Edward Ng, Jianhui Shan, Jihoon Kim, SungEun Hong, Durairaj Baskaran, Guanyang Lin, Ankit Vora, Melia Tjio, Noel Arellano, Charles T. Rettner, Elizabeth Lofano, Chi-Chun Liu, Hsinyu Tsai, Anindarupa Chunder, Khanh Nguyen, Alexander M. Friz, Amy N. Bowers, Srinivasan Balakrishnan, Joy Y. Cheng, Daniel P. Sanders
Advances in Patterning Materials and Processes XXXII9425, 2015
Abstract   scaling, polymer, physics, orientation control, nanotechnology, methacrylate, lamella, dry etching, directed self assembly, copolymer

Customization and design of directed self-assembly using hybrid prepatterns
Cheng, Joy and Doerk, Gregory S and Rettner, Charles T and Singh, Gurpreet and Tjio, Melia and Truong, Hoa and Arellano, Noel and Balakrishnan, Srinivasan and Brink, Markus and Tsai, Hsinyu and others
SPIE Advanced Lithography, pp. 942307--942307, 2015
Abstract

Directed Self-Assembly of Silicon-Containing Block Copolymer Thin Films
Michael J Maher, Charles T Rettner, Christopher Bates, Gregory Blachut, Matthew C Carlson, William J Durand, Christopher J Ellison, Daniel P Sanders, Joy Y Cheng, C Grant Willson
ACS applied materials \& interfaces, ACS Publications, 2015


2014

Electrical characterization of FinFETs with fins formed by directed self assembly at 29 nm fin pitch using a self-aligned fin customization scheme
Tsai, Hsinyu and Miyazoe, Hiroyuki and Chang, Josephine B and Pitera, Jed and Liu, Chi-Chun and Brink, Markus and Lauer, Isaac and Cheng, Joy Y and Engelmann, Sebastian and Rozen, John and others
Electron Devices Meeting (IEDM), 2014 IEEE International, pp. 32--1
Abstract

Directed Self-assembly of Topcoat-free, Integration-friendly High- Block Copolymers
Ankit Vora, Anindarupa Chunder, Melia Tjio, Srinivasan Balakrishman, Elizabeth Lofano, Joy Cheng, Daniel P. Sanders, Eri Hirahara, Yasushi Akiyama, Orest Polishchuk, Margareta Paunescu, Durairaj Baskaran, SungEun Hong, Guanyang Lin
Journal of Photopolymer Science and Technology 27(4), 419-424, 2014
nanotechnology, materials science, directed self assembly, copolymer

Spin-on organic hardmask for topo-patterned substrate
Kazuhiko Komura, Yoshi Hishiro, Goji Wakamatsu, Yoshio Takimoto, Tomoki Nagai, Tooru Kimura, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Noel Arellano, Srinivasan Balakrishnan, Luisa D. Bozano, Ananthakrishnan Sankaranarayanan, Krishna M. Bajjuri, Daniel P. Sanders, Carl E. Larson, Anuja DeSilva, Martin Glodde
Advances in Patterning Materials and Processes XXXI9051, 2014
Abstract   thermal resistance, substrate, shrinkage, physics, photoresist, optoelectronics, optics, nanotechnology, material properties, lithography, chemical mechanical planarization, chemical vapor deposition

Directed Self-assembly of Topcoat-free, Integration-friendly High-$\chi$ Block Copolymers
Ankit Vora, Anindarupa Chunder, Melia Tjio, Srinivasan Balakrishman, Elizabeth Lofano, Joy Cheng, Daniel P Sanders, Eri Hirahara, Yasushi Akiyama, Orest Polishchuk, others
Journal of Photopolymer Science and Technology 27(4), 419--424, The Society of Photopolymer Science and Technology (SPST), 2014

Enabling complex nanoscale pattern customization using directed self-assembly
Gregory S Doerk, Joy Y Cheng, Gurpreet Singh, Charles T Rettner, Jed W Pitera, Srinivasan Balakrishnan, Noel Arellano, Daniel P Sanders
Nature communications5, Nature Publishing Group, 2014

Spin-on organic hardmask materials for topo-patterned substrate
Kazuhiko Komura, Yoshi Hishiro, Goji Wakamatsu, Yoshio Takimoto, Tomoki Nagai, Tooru Kimura, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Noel Arellano, others
SPIE Advanced Lithography, pp. 905115--905115, 2014



2013

Defects on high-resolution negative-tone resist: "The revenge of the blobs"
M. I. Sanchez, L. K. Sundberg, L. D. Bozano, R. Sooriyakumaran, D. P. Sanders, T. Senna, M. Tanabe, T. Komizo, I. Yoshida, A. E. Zweber
SPIE Photomask Technology8880, 2013
Abstract   solubility, resist, optoelectronics, optics, optical engineering, materials science

Accessing New Materials through Polymerization and Modification of a Polycarbonate with a Pendant Activated Ester
Amanda C Engler, Julian MW Chan, Daniel J Coady, Jeannette M O’Brien, Haritz Sardon, Alshakim Nelson, Daniel P Sanders, Yi Yan Yang, James L Hedrick
Macromolecules 46(4), 1283--1290, ACS Publications, 2013

Defects on high-resolution negative-tone resist: The revenge of the blobs
MI Sanchez, LK Sundberg, LD Bozano, R Sooriyakumaran, DP Sanders, T Senna, M Tanabe, T Komizo, I Yoshida, AE Zweber
SPIE Photomask Technology, pp. 88800V--88800V, 2013

Deterministically isolated gratings through the directed self-assembly of block copolymers
Gregory S Doerk, Joy Y Cheng, Charles T Rettner, Srinivasan Balakrishnan, Noel Arellano, Daniel P Sanders
SPIE Advanced Lithography, pp. 86800Y--86800Y, 2013

Pattern transfer of directed self-assembly patterns for CMOS device applications
H Tsai, H Miyazoe, S Engelmann, CC Liu, L Gignac, J Bucchignano, D Klaus, C Breslin, E Joseph, J Cheng, D Sanders, M Guillorn
J. Micro/Nanolith. MEMS MOEMS., 2013

Synthesis of functionalized cyclic carbonate monomers using a versatile pentafluorophenyl carbonate intermediate
Daniel P Sanders, Daniel J Coady, Manabu Yasumoto, Masaki Fujiwara, Haritz Sardon, James L Hedrick
Polym. Chem. 5(2), 327--329, The Royal Society of Chemistry, 2013


2012

Special Section Guest Editorial: Directed Self-Assembly
D.P. Sanders, W.H. Arnold
Journal of Micro/Nanolithography, MEMS, and MOEMS 11(3), 031301--1, International Society for Optics and Photonics, 2012

Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns
Gregory S Doerk, Chi-Chun Liu, Joy Y Cheng, Charles T Rettner, Jed W Pitera, Leslie Krupp, Teya Topuria, Noel Arellano, Daniel P Sanders
SPIE Advanced Lithography, pp. 83230P--83230P, 2012


Pattern placement accuracy in block copolymer directed self-assembly based on chemical epitaxy
Gregory S Doerk, Chi-Chun Liu, Joy Y Cheng, Charles T Rettner, Jed W Pitera, Leslie E Krupp, Teya Topuria, Noel Arellano, Daniel P Sanders
ACS nano 7(1), 276--285, ACS Publications, 2012

Directed self-assembly defectivity assessment. Part II
C. Bencher, H. Yi, J. Zhou, M. Cai, J. Smith, L. Miao, O. Montal, S. Blitshtein, A. Lavi, K. Dotan, others
Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series, pp. 13, 2012


2011

Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab
C. Bencher, J. Smith, L. Miao, C. Cai, Y. Chen, J.Y. Cheng, D.P. Sanders, M. Tjio, H.D. Truong, S. Holmes, others
Proc. SPIE, pp. 79700F, 2011


2010

High contact angle fluorosulfonamide-based materials for immersion lithography
D.P. Sanders, L.K. Sundberg, M. Fujiwara, Y. Terui, M. Yasumoto
SPIE Advanced Lithography, pp. 763925--763925, 2010

Self-assembling materials for lithographic patterning: overview, status, and moving forward
W. Hinsberg, J. Cheng, H.C. Kim, D.P. Sanders
SPIE Advanced Lithography, pp. 76370G--76370G, 2010

Advances in patterning materials for 193 nm immersion lithography
D.P. Sanders
Chemical reviews 110(1), 321, 2010

Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist
J. Y. Cheng, D. P. Sanders, H. D. Truong, S. Harrer, A. Fritz, S. Holmes, M. E. Colburn, W. D. Hinsberg
J. Am. Chem. Soc. Nano, ACS Publications, 2010

A simple and efficient synthesis of functionalized cyclic carbonate monomers using a versatile pentafluorophenyl ester intermediate
D.P. Sanders, K. Fukushima, D.J. Coady, A. Nelson, M. Fujiwara, M. Yasumoto, J.L. Hedrick
Journal of the American Chemical Society, ACS Publications, 2010


2009

Directed self-assembly on sparse chemical patterns for lithographic applications
Joy Y Cheng, Alshakim Nelson, Charles T Rettner, Daniel P Sanders, Alexander Sutherland, Jed W Pitera, Young-Hye La, Ho-Cheol Kim, William D Hinsberg
Journal of Photopolymer Science and Technology22, 219-222, 2009

HydrogenBonding Catalysts Based on Fluorinated Alcohol Derivatives for Living Polymerization
Olivier Coulembier, Daniel P. Sanders, Alshakim Nelson, Andrew N. Hollenbeck, Hans W. Horn, Julia E. Rice, Masaki Fujiwara, Philippe Dubois, James L. Hedrick
Angewandte Chemie 48(28), 5170-5173, 2009
Abstract   substrate, polymerization, polymer chemistry, organic chemistry, living polymerization, hydrogen bond, chemistry, catalysis, alcohol

The Photopolymer Science and Technology Award
D.L. Goldfarb, L. Vylicky, S.D. Burns, K. Petrillo, J. Arnold, A. Lisi, D. Pfeiffer, D.P. Sanders, R.D. Allen, D.R. Medeiros, others
Journal of Photopolymer Science and Technology 22(1), 7--11, J-STAGE, 2009

Hydrogen-Bonding Catalysts Based on Fluorinated Alcohol Derivatives for Living Polymerization
Olivier Coulembier, Daniel P Sanders, Alshakim Nelson, Andrew N Hollenbeck, Hans W Horn, Julia E Rice, Masaki Fujiwara, Philippe Dubois, James L Hedrick
Angew. Chem. Int. Ed. 48(28), 5170, Wiley Online Library, 2009
Abstract


2008

The limitations of high-index resists for 193-nm hyper-NA lithography
Gregory McIntyre, Daniel Sanders, Ratnam Sooriyakumaran, Hoa Truong, Robert Allen
Proceedings of SPIE, the International Society for Optical Engineering6923, 2008
Abstract   resist, refractive index, physics, photolithography, optics, numerical aperture, lithography, immersion lithography, immersion, exposure latitude

Dense Self-Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers
Joy Y. Cheng, Charles T. Rettner, Daniel P. Sanders, Ho-Cheol Kim, William D. Hinsberg
Advanced Materials 20(16), 3155-3158, 2008
self assembly, nanotechnology, materials science, lithography, copolymer

The limitations of high index resists for 193nm hyper-NA lithography
G. McIntyre, D. Sanders, R. Sooriyakumaran, H. Truong, R. Allen
HJ Levinson, MV Dusa, Proc. of SPIE6923, 692304, 2008

Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography
D.L. Goldfarb, L. Vyklicky, S.D. Burns, K. Petrillo, J. Arnold, A. Lisi, D. Pfeiffer, D.D. Sanders, R.D. Allen, D.R. Medeiros, others
Journal of Photopolymer Science and Technology 21(3), 397--404, J-STAGE, 2008

Graded spin-on organic bottom antireflective coating for high NA lithography
D.L. Goldfarb, S.D. Burns, L. Vyklicky, D. Pfeiffer, A. Lisi, K. Petrillo, J. Arnold, D.P. Sanders, A. Clancy, R.N. Lang, others
Proceedings of SPIE, the International Society for Optical Engineering, pp. 69230V--1, 2008

Integration of polymer self-assembly for lithographic application
J.Y. Cheng, D.P. Sanders, H.C. Kim, L.K. Sundberg
Integration of polymer self-assembly for lithographic application,” Proc. SPIE6921, 692127, 2008

Self-segregating materials for immersion lithography
D.P. Sanders, L.K. Sundberg, P.J. Brock, H. Ito, H.D. Truong, R.D. Allen, G.R. McIntyre, D.L. Goldfarb
Proc. SPIE Int. Soc. Opt. Eng, pp. 692309, 2008



2007

Fluoro-alcohol materials with tailored interfacial properties for immersion lithography
Daniel P. Sanders, Linda K. Sundberg, Ratnam Sooriyakumaran, Phillip J. Brock, Richard A. DiPietro, Hoa D. Truong, Dolores C. Miller, Margaret C. Lawson, Robert D. Allen
Proceedings of SPIE, the International Society for Optical Engineering6519, 2007
Abstract   surface energy, resist, polymer, physics, photolithography, optics, nanotechnology, immersion lithography, immersion, fluoropolymer, contact angle

Contact angles and structure/surface property relationships of immersion materials
L.K. Sundberg, D.P. Sanders, R. Sooriyakumaran, P.J. Brock, R.D. Allen
Advanced Lithography, pp. 65191Q--65191Q, 2007

New materials for surface energy control of 193 nm photoresists
D. Sanders, L. Sundberg, H. Ito, P. Brock, R. Sooriyakumaran, H. Truong, R. Allen
4th International Symposium on Immersion Lithography, Keystone, Colorado, USA, 2007

Fundamental analysis of nanoparticle-based high index immersion fluids
J. Hoffnagle, D. Milliron, S. Swanson, D. Sanders, B. Hinsberg
4th International Symposium on Immersion Lithography, Keystone, CO, pp. 8--11, 2007

High refractive index polymer platforms for 193nm immersion lithography
R. Sooriyakumaran, DP Sanders, H. Truong, RD Allen, ME Colburn, GR McIntyre
4th Intl. Symp. on Immersion Lithography, Keystone Colorado, USA, 2007


2006

Fundamental Properties of Fluoroalcohol-Methacrylate Polymers for use in 193nm Lithography
AD Allen, G. Breyta, P. Brock, R. DiPietro, D. Sanders, R. Sooriyakumaran, LK Sundberg
Journal of Photopolymer Science and Technology 19(5), 569--572, J-STAGE, 2006


2005


Prevention of undesirable isomerization during olefin metathesis
S.H. Hong, D.P. Sanders, C.W. Lee, R.H. Grubbs
Journal of the American Chemical Society 127(49), 17160--17161, ACS Publications, 2005


2003

Vacuum-UV influenced design of polymers and dissolution inhibitors for next generation photolithography
B.C. Trinque, C.R. Chambers, B.P. Osborn, R.P. Callahan, G.S. Lee, S. Kusumoto, D.P. Sanders, R.H. Grubbs, W.E. Conley, C.G. Willson
Journal of fluorine chemistry 122(1), 17--26, Elsevier, 2003

Metal-Catalyzed Addition Polymers for 157 nm Resist Applications. Synthesis and Polymerization of Partially Fluorinated, Ester-Functionalized Tricyclo [4.2. 1.02, 5] non-7-enes
D.P. Sanders, E.F. Connor, R.H. Grubbs, R.J. Hung, B.P. Osborn, T. Chiba, S.A. MacDonald, C.G. Willson, W. Conley
Macromolecules 36(5), 1534--1542, ACS Publications, 2003

A general model for selectivity in olefin cross metathesis
A.K. Chatterjee, T.L. Choi, D.P. Sanders, R.H. Grubbs
Journal of the American Chemical Society 125(37), 11360--11370, ACS Publications, 2003


2002

Synthesis of symmetrical trisubstituted olefins by cross metathesis
A.K. Chatterjee, D.P. Sanders, R.H. Grubbs
Organic letters 4(11), 1939--1942, ACS Publications, 2002

Comparison of optical coherence tomography, X-ray computed tomography, and confocal microscopy results from an impact damaged epoxy/E-glass composite
J.P. Dunkers, D.P. Sanders, D.L. Hunston, M.J. Everett, W.H. Green
The Journal of Adhesion 78(2), 129--154, Taylor \& Francis, 2002

Metal-catalyzed vinyl addition polymers for 157 nm resist applications. 2. Fluorinated norbornenes: Synthesis, polymerization, and initial imaging results
H.V. Tran, R.J. Hung, T. Chiba, S. Yamada, T. Mrozek, Y.T. Hsieh, C.R. Chambers, B.P. Osborn, B.C. Trinque, M.J. Pinnow, others
Macromolecules 35(17), 6539--6549, ACS Publications, 2002


2001

The prediction of permeability for an epoxy/E-glass composite using optical coherence tomographic images
J.P. Dunkers, F.R. Phelan, C.G. Zimba, K.M. Flynn, D.P. Sanders, R.C. Peterson, R.S. Parnas, X. Li, J.G. Fujimoto
Polymer composites 22(6), 803--814, Wiley Online Library, 2001

The application of optical coherence tomography to problems in polymer matrix composites
J.P. Dunkers, F.R. Phelan, D.P. Sanders, M.J. Everett, W.H. Green, D.L. Hunston, R.S. Parnas
Optics and lasers in engineering 35(3), 135--147, Elsevier, 2001


Resist materials for 157-nm microlithography: an update
R.J. Hung, H.V. Tran, B.C. Trinque, T. Chiba, S. Yamada, D. Sanders, E.F. Connor, R.H. Grubbs, J.M. Klopp, J.M.J. Frechet, others
Proc. SPIE, pp. 385, 2001


2000


Improved thermal and mechanical properties of polybenzoxazines based on alkyl-substituted aromatic amines
H. Ishida, D.P. Sanders
Journal of Polymer Science Part B: Polymer Physics 38(24), 3289--3301, Wiley Online Library, 2000


1999

Regioselective influence of alkyl-substituted arylamines on the network structure in polybenzoxazines
D.P. Sanders
Ph.D. Thesis, 1999


1998

New quantitative optical depth profiling methods by attenuated total reflectance Fourier transform infrared spectroscopy: Multiple angle/single frequency and single angle/multiple frequency approaches
H. Ishida, S. Ekgasit, D.P. Sanders
AIP Conference Proceedings, pp. 40, 1998


Year Unknown

Directed Self-Assembly
D.P. Sanders, W.H. Arnold
proceedings.spiedigitallibrary.org, 0

IMAGING OF COMPOSITE DEFECTS AND DAMAGE USING OPTICAL COHERENCE TOMOGRAPHY
J.P. Dunkers, M.J. Everett, D.P. Sanders, D.L. Hunston
JP Dunkers, MJ Everett, DP Sanders..., 0

Directed Polymer Self-assembly for Lithography Application
J.Y. Cheng, D.P. Sanders, C.T. Rettner, H. Truong, W.D. Hinsberg, H.C. Kim, R.D. Allen
JY Cheng, DP Sanders, CT Rettner, H Truong..., 0