Daniel P (Dan) Sanders  Daniel P (Dan) Sanders photo         

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Manager - Electronic Materials and Accelerated Materials Discovery
Almaden Research Center, San Jose, CA, USA
  +1dash408dash927dash2604

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Professional Associations

Professional Associations:  American Chemical Society


2018

NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS
Takehisa Ishimaru, Satoru Narizuka, Daniel P. Sanders, Ratnam Sooriyakumaran, Hoa D. Truong, Rudy J. Wojtecki
sulfonic acid, sulfonate, substituent, side chain, polymer chemistry, polymer, monomer, ketone, ionic bonding, chemistry
Abstract

FLUORINATED SULFONATE ESTERS OF ARYL KETONES FOR NON-IONIC PHOTO-ACID GENERATORS
Takehisa Ishimaru, Satoru Narizuka, Daniel P. Sanders, Ratnam Sooriyakumaran, Hoa D. Truong, Rudy J. Wojtecki
thermal stability, sulfonic acid, sulfonate, substituent, polymer chemistry, nucleophile, ketone, hydrolysis, chemistry, aryl
Abstract

NON-IONIC LOW DIFFUSING PHOTO-ACID GENERATORS
Takehisa Ishimaru, Satoru Narizuka, Daniel P. Sanders, Ratnam Sooriyakumaran, Hoa D. Truong, Rudy J. Wojtecki
thermal reaction, sulfonic acid, resist, radiation, photochemistry, ionic bonding, high energy, extreme ultraviolet, diffusion, chemistry
Abstract


2017

THIN FILM SELF ASSEMBLY OF TOPCOAT-FREE SILICON-CONTAINING DIBLOCK COPOLYMERS
Noel Arellano, Teddie P. Magbitang, Daniel P. Sanders, Kristin Schmidt, Ankit Vora
trimethylsilyl, thin film, silicon, self assembly, repeat unit, polymer, materials science, lamellar structure, copolymer, chromatography
Abstract

BLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY APPLICATIONS
Noel Arellano, Joy Cheng, Teddie P. Magbitang, Jed W. Pitera, Daniel P. Sanders, Kristin Schmidt, Hoa D. Truong, Ankit Vora
surface energy, self assembly, ring opening polymerization, repeat unit, polymer, organic chemistry, monomer, copolymer, chemistry, carbonate
Abstract

HIGH-CHI BLOCK COPOLYMERS FOR INTERCONNECT STRUCTURES BY DIRECTED SELF-ASSEMBLY
Chi-chun Liu, Teddie P. Magbitang, Daniel P. Sanders, Kristin Schmidt, Ankit Vora
trimethylsilyl, styrene, self assembly, polyester, polycarbonate, methyl methacrylate, materials science, copolymer, composite material
Abstract


2016

FLUORO-ALCOHOL ADDITIVES FOR ORIENTATION CONTROL OF BLOCK COPOLYMERS
Joy Cheng, Anindarupa Chunder, Daniel P. Sanders, Melia Tjio, Ankit Vora
wetting, surface energy, styrene, polymer chemistry, polycarbonate, perpendicular, materials science, lamellar structure, cylinder, copolymer, chemical engineering
Abstract

Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers
Markus Brink, Joy Cheng, Gregory S. Doerk, Alexander M. Friz, Michael A. Guillorn, Chi-chun Liu, Daniel P. Sanders, Gurpreet Singh, Melia Tjio, Hsinyu Tsai
wetting, semi major axis, perpendicular, materials science, lamellar structure, lamella, engineering drawing, directed self assembly, copolymer, composite material
Abstract


2015

Formation of a composite pattern including a periodic pattern self-aligned to a prepattern
Cheng, Joy and Doerk, Gregory S and Rettner, Charles T and Sanders, Daniel P
US Patent 9,107,291
Abstract

Additives for orientation control of block copolymers
Joy Cheng, Anindarupa Chunder, Daniel P. Sanders, Melia Tjio, Ankit Vora
wetting, surface energy, styrene, repeat unit, polymer chemistry, polycarbonate, materials science, lamellar structure, copolymer, chemical engineering, carboxylic acid
Abstract


2014

Methods of forming block polymers for directed self-assembly
Joy Cheng, Anindarupa Chunder, Daniel P. Sanders, Melia Tjio, Ankit Vora
ring opening polymerization, polymer chemistry, polymer, monomer, materials science, ethylene, directed self assembly, chemical structure, carbonate
Abstract

Non-ionic photo-acid generating polymers for resist applications
Takehisa Ishimaru, Satoru Narizuka, Daniel P. Sanders, Ratnam Sooriyakumaran, Hoa D. Truong, Rudy J. Wojtecki, Manabu Yasumoto
sulfonate, resist, polymer chemistry, polymer, photochemistry, monomer, materials science, lithography, ionic bonding, extreme ultraviolet, amide
Abstract


2013

Sulfonamid-enthaltende Deckschicht- und Fotoresist-Zusatzstoff-Zusammensetzung und Verfahren zur Vermeidung
Masaki Fujiwara, Daniel Paul Sanders, Yoshibaru Terui

Abstract

Cyclische Carbonylverbindung mit anhangenden Pentafluorphenylcarbonatgruppen,Herstellung davon und Polymere davon
Daniel Paul Sanders, James Lupton Hedrick, Manabu Yasumoto, Masaki Fujiwara

Abstract


Semiconductor interconnect structure having enhanced performance and reliability
Jr. Cabral Cyril, Geraud Jean-Michel Dubois, Daniel C. Edelstein, Takeshi Nogami, Daniel P. Sanders
US Patent App 20130075908



2012


Method for designing optical lithography masks for directed self-assembly
Joy Cheng, Kafai Lai, Wai-kin Li, Young-Hye Na, Jed Walter Pitera, Charles Thomas Rettner, Daniel Paul Sanders, Da Yang
US Patent 8,336,003


2011



Aligning polymer films
J. Cheng, D.P. Sanders, R. Sooriyakumaran, others
US Patent 7,906,031


Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties
J. Cheng, D.L. Goldfarb, D.R. Medeiros, D.P. Sanders, D. Pfeiffer, L. Vyklicky
US Patent 20,110,300,483

Self-topcoating photoresist for photolithography
R. Allen, P. Brock, S. Kusumoto, Y. Nishimura, D.P. Sanders, M.S. Slezak, R. Sooriyakumaran, L.K. Sundberg, H. Trung, G.M. Wallraff, others
US Patent 7,951,524



2010

SULFONAMIDE-CONTAINING PHOTORESIST COMPOSITIONS AND METHODS OF USE
D.P. Sanders, M. Fujiwara, Y. Terui
US Patent App. 12/709,346

METHOD FOR IMPROVING SELF-ASSEMBLED POLYMER FEATURES
J. Cheng, H. Namai, D.P. Sanders
US Patent App. 12/913,835




METHODS OF FORMING TOPOGRAPHICAL FEATURES USING SEGREGATING POLYMER MIXTURES
J. Cheng, H. Namai, C.T. Rettner, D.P. Sanders, R. Sooriyakumaran
US Patent App. 12/957,008


Functionalized carbosilane polymers and photoresist compositions containing the same
R.D. Allen, M.E. Colburn, D.P. Sanders, R. Sooriyakumaran, H.D. Truong
US Patent App. 12/938,459


Graded spin-on organic antireflective coating for photolithography
C.J. Brodsky, S.D. Burns, D.L. Goldfarb, M. Lercel, D.R. Medeiros, D. Pfeiffer, D.P. Sanders, S.A. Scheer, L. Vyklicky, others
US Patent 7,816,069

GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY
R.D. Allen, P. Brock, D.P. Sanders, L.K. Sundberg
US Patent App. 12/687,380


2009

Methods of directed self-assembly and layered structures formed therefrom
Joy Cheng, William D Hinsberg, Hiroshi Ito, Atsuko Ito, Ho-cheol Kim, Young-Hye Na, Daniel P Sanders, Linda Karin Sundberg, Hoa D Truong, Gregory Michael Wallraff, others
US Patent App. 12/641,959

Impurity reduction in Olefin metathesis reactions
C.W. Lee, S.H. Hong, D.P. Sanders, R.H. Grubbs, R.L. Pederson, others
US Patent 7,507,854

METHODS OF DIRECTED SELF-ASSEMBLY, AND LAYERED STRUCTURES FORMED THEREFROM
J. Cheng, M.E. Colburn, S. Harrer, W.D. Hinsberg, S.J. Holmes, KIM Ho-Cheol, D.P. Sanders
US Patent App. 12/642,018


Method of Ring-Opening Polymerization, and Related Compositions and Articles
O. Coulembier, J.L. Hedrick, A. Nelson, J.E. Rice, D.P. Sanders
US Patent App. 12/475,700


Method of forming polymer features by directed self-assembly of block copolymers
K. Cheng, B.B. Doris, P. Kulkarni, G. Shahidi
US Patent App. 12/542,771


2008

ORGANIC GRADED SPIN ON BARC COMPOSITIONS FOR HIGH NA LITHOGRAPHY
D.L. Goldfarb, L. Vyklicky, S.D. Burns, D.R. Medeiros, D.P. Sanders, R.D. Allen
US Patent App. 12/018,541

METHOD OF FORMING POLYMER FEATURES BY DIRECTED SELF-ASSEMBLY OF BLOCK COPOLYMERS
J. Cheng, W.D. Hinsberg, H.C. Kim, C.T. Rettner, D.P. Sanders
US Patent App. 12/061,693


METHODS FOR ALIGNING POLYMER FILMS AND RELATED STRUCTURES
J. Cheng, D.P. Sanders, R. Sooriyakumaran
US Patent App. 12/058,006


2006

Cross-metathesis reaction of functionalized and substituted olefins using group 8 transition metal carbene complexes as metathesis catalysts
R.H. Grubbs, A.K. Chatterjee, T.L. Choi, S.D. Godberg, J.A. Love, J.P. Morgan, D.P. Sanders, M. Scholl, F.D. Toste, T.M. Trnka, others
US Patent App. 11/559,399

SELF-TOPCOATING RESIST FOR PHOTOLITHOGRAPHY
R.D. Allen, P.J. Brock, C.E. Larson, D.P. Sanders, R. Sooriyakumaran, L.K. Sundberg, H.D. Truong, G.M. Wallraff
US Patent App. 11/380,731


2005

Latent, high-activity olefin metathesis catalysts containing an N-heterocyclic carbene ligand
T. Ung, Y. Schrodi, M.S. Trimmer, A. Hejl, D. Sanders, R.H. Grubbs
US Patent App. 11/094,102