Hoa D. Truong  Hoa D. Truong photo         

contact information

Lithography process development
Almaden Research Center, San Jose, CA, USA


Professional Associations

Professional Associations:  SPIE -- International Society of Optical Engineering


Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist
J. Y. Cheng, D. P. Sanders, H. D. Truong, S. Harrer, A. Fritz, S. Holmes, M. E. Colburn, W. D. Hinsberg
J. Am. Chem. Soc. Nano, ACS Publications, 2010


Investigation of polymer-bound PAGs: Synthesis, characterization and initial structure/property relationships of anion-bound resists
Robert D Allen, Phillip J Brock, Young-Hye Na, Mark H Sherwood, Hoa D Truong, Gregory M Wallraff, Masaki Fujiwara, Kazuhiko Maeda
Journal of Photopolymer Science and Technology 22(1), 25--29, The Society of Photopolymer Science and Technology (SPST), 2009


Self-segregating materials for immersion lithography
D.P. Sanders, L.K. Sundberg, P.J. Brock, H. Ito, H.D. Truong, R.D. Allen, G.R. McIntyre, D.L. Goldfarb
Proc. SPIE Int. Soc. Opt. Eng, pp. 692309, 2008


New materials for surface energy control of 193 nm photoresists
D. Sanders, L. Sundberg, H. Ito, P. Brock, R. Sooriyakumaran, H. Truong, R. Allen
4th International Symposium on Immersion Lithography, Keystone, Colorado, USA, 2007

High refractive index polymer platforms for 193nm immersion lithography
R. Sooriyakumaran, DP Sanders, H. Truong, RD Allen, ME Colburn, GR McIntyre
4th Intl. Symp. on Immersion Lithography, Keystone Colorado, USA, 2007


Fluoropolymers for 157/193nm Lithography: Chemistry, New Platform, Formulation Strategy, and Lithographic Evaluation
H. Ito, HD Truong, M. Okazaki, DC Miller, N. Fender, PJ Brock, GM Wallraff, CE Larson, RD Allen
Journal of Photopolymer Science and Technology 15(4), 591--602, TECHNICAL ASSOC OF PHOTOPOLYMERS JAPAN, 2002


Development of 157 nm positive resists
H. Ito, GM Wallraff, N. Fender, PJ Brock, WD Hinsberg, A. Mahorowala, CE Larson, HD Truong, G. Breyta, RD Allen
Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures 19(6), 2678--2684, AVS, 2001

IBM 193-nm bilayer resist: materials, lithographic performance, and optimization
R.W. Kwong, P.R. Varanasi, M.C. Lawson, T. Hughes, G.M. Jordhamo, M. Khojasteh, A.P. Mahorowala, R. Sooriyakumaran, P.J. Brock, C.E. Larson, others
Proceedings of SPIE, pp. 50, 2001

Novel Fluoropolymers for Use in 157nm Lithography
H. Ito, GM Wallraff, N. Fender, PJ Brock, CE Larson, HD Truong, G. Breyta, DC Miller, MH Sherwood, RD Allen
Journal of Photopolymer Science and Technology 14(4), 583--594, TECHNICAL ASSOC OF PHOTOPOLYMERS JAPAN, 2001


Progress in 193-nm Resists: Impact of the Development Process on Anhydride-Containing Resist Materials
RD Allen, CE Larson, HD Truong, PJ Brock, H. Ito
Journal of Photopolymer Science and Technology 13(4), 595--600, TECHNICAL ASSOC OF PHOTOPOLYMERS JAPAN, 2000

Year Unknown

Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly (norbornenes)

Proceedings of SPIE, 2000

Bilayer Resists for 193 nm Lithography: SSQ and POSS

Journal of Photopolymer ..., 2006 - J-STAGE

Lactones in 193 nm resists: What do they do?

Proc. SPIE, 2008 -

Novel Classes of Cyclic Olefin Polymers for 193nm Lithography

Journal of ..., 2001 - sciencelinks.jp

ArF excimer laser resists based on fluoroalcohol

Polymers for ..., 2006 - Wiley Online Library

Projects and Groups