Nathan Marchack  Nathan Marchack photo         

contact information

Resarch Staff Member - Advanced Plasma Physics and Process
Thomas J. Watson Research Center, Yorktown Heights, NY USA


Professional Associations

Professional Associations:  American Vacuum Society  |  Electrochemical Society (ECS)  |  Materials Research Society (MRS)

more information

More information:  Prof. Jane Chang, UCLA  |  Nathan Marchack - Youtube  |  Nathan Marchack - Google Scholar


Localization and quantification of trace-gas fugitive emissions using a portable optical spectrometer
E. J. Zhang, C. C. Teng, T. G. van Kessel, L. Klein, R. Muralidhar, C. Xiong, Y. Martin, J. S. Orcutt, M. Khater, L. Schares, T. Barwicz, N. Marchack, S. Kamlapurkar, S. Engelmann, G. Wysocki, N. Sosa, W. M. J. Green
Proc. SPIE 10629, Chemical, Biological, Radiological, Nuclear, and Explosives (CBRNE) Sensing XIX , 106290Y, 2018

Nitride etching with hydrofluorocarbons III: Comparison of C4H9F and CH3F for low-k' nitride spacer etch processes
Hiroyuki Miyazoe, Nathan Marchack, Robert L. Bruce, Yu Zhu, Masahiro Nakamura, Eric Miller, Sivananda Kanakasabapathy, Takefumi Suzuki, Azumi Ito, Hirokazu Matsumoto, Sebastian U. Engelmann, Eric A. Joseph
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 36(3), 032201, 2018

Nitride etching with hydrofluorocarbons. II. Evaluation of C4H9F for tight pitch Si3N4 patterning applications
Nathan Marchack, Hiroyuki Miyazoe, Robert L. Bruce, Hsinyu Tsai, Masahiro Nakamura, Takefumi Suzuki, Azumi Ito, Hirokazu Matsumoto, Sebastian U. Engelmann, Eric A. Joseph
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 36(3), 031801, 2018

Scalable Nanostructured Carbon Electrode Arrays for Enhanced Dopamine Detection
Silvia Demuru, Luca Nela, Nathan Marchack, Steven J. Holmes, Damon B. Farmer, George S. Tulevski, Qinghuang Lin, Hariklia Deligianni
ACS Sensors 3(4), 799-805, 2018
Abstract   PMID: 29480715


Methane trace-gas sensing enabled by silicon photonic integration
William Green, Chi Xiong, Marwan Khater, Yves Martin, Eric Zhang, Chu Teng, Jason Orcutt, Laurent Schares, Tymon Barwicz, Nathan Marchack, Steven Holmes, Swetha Kamlapurkar, Sebastian Engelmann, Gerard Wysocki
European Materials Research Society Spring Meeting, P.17.1, 2017

Key parameters affecting STT-MRAM switching efficiency and improved device performance of 400C-compatible p-MTJs
G. Hu, M. G. Gottwald, Q. He, J. H. Park, G. Lauer, J. J. Nowak, S. L. Brown, B. Doris, D. Edelstein, E. R. Evarts, P. Hashemi, B. Khan, Y. H. Kim, C. Kothandaraman, N. Marchack, E. J. O'Sullivan, M. Reuter, R. P. Robertazzi, J. Z. Sun, T. Suwannasiri, P.
2017 IEEE International Electron Devices Meeting (IEDM), pp. 38.3.1-38.3.4

Etching Methods for STT-MRAM
E. J. O'Sullivan, Anthony J Annunziata, Jemima Gonsalves, G. Hu, Eric A Joseph, Raman Kothandaraman, Gen Lauer, Nathan Marchack, J. J. Nowak, R. P. Robertazzi, J. Z. Sun, Thitima Suwannasiri, P. L. Trouilloud, Yu Zhu, D. C. Worledge
ECS Meeting Abstracts MA2017-02(26), 1138

Low-current Spin Transfer Torque MRAM
G. Hu, J. J. Nowak, G. Lauer, J. H. Lee, J. Z. Sun, J. Harms, A. Annunziata, S. Brown, W. Chen, Y. H. Kim, N. Marchack, S. Murthy, C. Kothandaraman, E. J. O'Sullivan, J. H. Park, M. Reuter, R. P. Robertazzi, P. L. Trouilloud, Y. Zhu, D. C. Worledge
2017 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA), pp. 1-2

Reducing LER in Si and SiN through plasma etch chemistry optimization for photonic waveguide applications
Nathan Marchack, Marwan Khater, Jason Orcutt, Josephine Chang, Steven Holmes, Tymon Barwicz, Swetha Kamlapurkar, William Green, Sebastian Engelmann
Proc. SPIE10149, 101490F-101490F-10, 2017

Cyclic Cl2/H2 quasi-atomic layer etching approach for TiN and TaN patterning using organic masks
Nathan Marchack, John M. Papalia, Sebastian Engelmann, Eric A. Joseph
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35(5), 05C314, 2017

Solder Mobility for High-Yield Self-Aligned Flip-Chip Assembly
Y. Martin, S. Kamlapurkar, J. W. Nah, N. Marchack, T. Barwicz
2017 IEEE 67th Electronic Components and Technology Conference (ECTC), pp. 667-674


Applications for Surface Engineering Using Atomic Layer Etching-Invited Paper
John Papalia, Nathan Marchack, Robert Bruce, Hiroyuki Miyazoe, Sebastian Engelmann, Eric A Joseph
Solid State Phenomena, pp. 41--48, 2016

Evaluation of ALE processes for patterning
J. M. Papalia, N. Marchack, R. L. Bruce, H. Miyazoe, S. U. Engelmann, E. A. Joseph
Proc. SPIE9782, 97820H-97820H-10, 2016


STT-MRAM with double magnetic tunnel junctions
G. Hu, J.H. Lee, J.J. Nowak, J.Z. Sun, J. Harms, A. Annunziata, S. Brown, W. Chen, Y.H. Kim, G. Lauer, L. Liu, N. Marchack, S. Murthy, E.J. O'Sullivan, J.H. Park, M. Reuter, R.P. Robertazzi, P.L. Trouilloud, Y. Zhu, D.C. Worledge
Electron Devices Meeting (IEDM), 2015 IEEE International, pp. 26.3.1-26.3.4

In-situ etch rate study of HfxLayOz in Cl2/BCl3 plasmas using the quartz crystal microbalance
Nathan Marchack, Taeseung Kim, Hans-Olof Blom, Jane P. Chang
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 33(3), 031305, 2015

Critical BEOL Aspects of the Fabrication of a Thermally-Assisted MRAM Device
E. J. O'Sullivan, Daniel Edelstein, Nathan Marchack, Michael Lofaro, Michael Gaidis, Eric Joseph, Anthony Annunziata, Dirk Pfeiffer, P. L. Trouilloud, Yu Zhu, Steve Holmes, Armand Galan, Adam M. Pyzna, Jemima Gonsalves
ECS Transactions 69(3), 127-137, 2015


Recent Advances in Magnetic Tunnel Junction Materials and Stack for Thermally-Assisted Magnetic Random Access Memory
A. Annunziata, P. Trouilloud, S. Bandiera, S. Brown, M. Gaidis, E. Gapihan, E. O'Sullivan, N. Marchack, D. Worledge
APS March Meeting Abstracts, 2014


Feature profile evolution during shallow trench isolation etching in chlorine-based plasmas. III. The effect of oxygen addition
Cheng-che Hsu, Nathan Marchack, Ryan M. Martin, Calvin Pham, John Hoang, Jane P. Chang
Journal of Vacuum Science & Technology B 31(4), 2013


Chemical Processing of Materials on Silicon: More Functionality, Smaller Features, and Larger Wafers
Nathan Marchack, Jane P. Chang
Annual Review of Chemical and Biomolecular Engineering 3(1), 235-262, 2012
Abstract   PMID: 22691090


Nanoscale etching and deposition
Nathan Marchack, Jane P Chang
Plasma Processing of Nanomaterials, 1, CRC Press, 2011

Perspectives in nanoscale plasma etching: what are the ultimate limits?
Nathan Marchack, Jane P Chang
Journal of Physics D: Applied Physics 44(17), 174011, 2011


Area Selective Atomic Layer Deposition by Microcontact Printing with a Water-Soluble Polymer
Marja N. Mullings, Han-Bo-Ram Lee, Nathan Marchack, Xirong Jiang, Zhebo Chen, Yelena Gorlin, Kuang-Po Lin, Stacey F. Bent
Journal of The Electrochemical Society 157(12), D600-D604, 2010