Robert R (Russ) Robison  Robert R (Russ) Robison photo         

contact information

Manager, TCAD and Emulation Group
Albany, NY


Professional Associations

Professional Associations:  IEEE   |  IEEE Electron Devices Society (EDS)


Impact of lateral asymmetric channel doping on 45-nm-technology N-type SOI MOSFETs
Nayfeh, Hasan M and Rovedo, Nivo and Bryant, Andres and Narasimha, Shreesh and Kumar, Arvind and Yu, Xiaojun and Su, Ning and Sleight, Jeffrey W and Robison, Robert R and Rausch, Werner and others
IEEE Transactions on Electron Devices 56(12), 3097--3105, IEEE, 2009