Nicole A Saulnier  Nicole A Saulnier photo         

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Manager, Semiconductor Materials and Process Technology Research
Albany, NY


Nicole Saulnier earned her Ph.D. in Electrical and Computer Engineering from Carnegie Mellon University where she studied computational modeling of single photon emitting devices. She joined IBM in 2011 as an advanced lithography engineer where she developed lithography processes for 10nm M1 and Mx immersion lithography multi-patterning schemes and EUV lithography solutions for the back end of line. As a member of the computational lithography team, Nicole specialized in resist modeling and source mask optimization for EUV lithography. In 2017, Nicole became a manager in the semiconductor materials and process technology research department.