Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Improvements in a 16-µm radiation source based upon the combined effects of stimulated rotational Raman scattering and resonantly enhanced four-wave mixing in parahydrogen gas are described. For this source, the input waves of which are provided by temporally and spatially coincident pulsed beams from a ruby and CO 2 TEA laser, it was found that cooling the parahydrogen gas from 300 K to <100 K, at constant molecular density, increased the output at 16 μm by roughly a factor 4. The maximum output was measured to be ~ 40 μJ/pulse, which is near the theoretical limit for the 2.5 MW CO 2 laser intensities that were applied. © 1977, IEEE. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Kigook Song, Robert D. Miller, et al.
Macromolecules
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989