Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
This report deals with the numerical evaluation of a class of functions of a complex variable that can be represented as Stielt] es transforms of nonnegative real functions. The considered class of functions contains, among others, the confluent hypergeometric functions of Whittaker and the Bessel functions. The method makes it possible, in principle, to compute the values of the function with an arbitrarily small error, using one and the same algorithm in whole complex plane cut along the negative real axis. Detailed numerical data are given for the application of the algorithm to the modified Bessel function K0(z). © 1967, AMS Publisher, All rights reserved.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
Fausto Bernardini, Holly Rushmeier
Proceedings of SPIE - The International Society for Optical Engineering
John R. Kender, Rick Kjeldsen
IEEE Transactions on Pattern Analysis and Machine Intelligence