A note on the reduction of two-way automata to one-way automata

Inbal Ronen, Elad Shahar, et al.

SIGIR 2009

Hans Becker, Frank Schmidt, et al.

Photomask and Next-Generation Lithography Mask Technology 2004

Kaoutar El Maghraoui, Gokul Kandiraju, et al.

WOSP/SIPEW 2010

Beomseok Nam, Henrique Andrade, et al.

ACM/IEEE SC 2006