K. Jain, S. Rice, et al.
Polymer Engineering & Science
Paper
Excimer laser projection photoetching
Abstract
Direct photoetching of various resists and polymers with a 193-nm ArF excimer laser has been demonstrated by imaging a mask through a projection lens. Feature sizes ranging from 2 to 20 μm have been cleanly etched in 1-μm-thick films.
Related
W.J. Kozlovsky, A.G. Dewey, et al.
SPIE Optical Data Storage Topical Meeting 1992
R.T. Kerth, K. Jain, et al.
IEEE Electron Device Letters
M.R. Latta, R.V. Pole
Applied Optics