Excimer laser projection photoetching

M.R. Latta; R. Moore; S. Rice; K. Jain

doi:10.1063/1.333923

Journal of Applied Physics

Paper

01 Jan 1984

Excimer laser projection photoetching

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Abstract

Direct photoetching of various resists and polymers with a 193-nm ArF excimer laser has been demonstrated by imaging a mask through a projection lens. Feature sizes ranging from 2 to 20 μm have been cleanly etched in 1-μm-thick films.

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Abstract

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Direct high-resolution excimer laser photoetching

EXCIMER LASER PROJECTION LITHOGRAPHY ON A FULL-FIELD SCANNING PROJECTION SYSTEM.

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Ultrafast deep UV lithography using excimer lasers