Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
This note continues work by the Lehmers [3], Gunderson [2], Granville and Monagan [1], and Tanner and Wagstaff [6], producing lower bounds for the prime exponent p in any counterexample to the first case of Fermat’s Last Theorem. We improve the estimate of the number of residues r mod p2such that rP= r mod p2and thereby improve the lower bound on p to 7.568 x 1017. © 1990 American Mathematical Society.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
J.P. Locquet, J. Perret, et al.
SPIE Optical Science, Engineering, and Instrumentation 1998
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
Jonathan Ashley, Brian Marcus, et al.
Ergodic Theory and Dynamical Systems