Joseph M. Jasinski, Joan K. Frisoli, et al.
Faraday Discussions of the Chemical Society
Mass spectrometric evidence is presented for the direct formation of gas-phase silyl radical, SiH3, as a product of the heterogeneous etching reaction of silicon films with hydrogen or deuterium atoms. © 1993.
Joseph M. Jasinski, Joan K. Frisoli, et al.
Faraday Discussions of the Chemical Society
Joseph M. Jasinski
Journal of Physical Chemistry
Jack O. Chu, David B. Beach, et al.
Journal of Physical Chemistry
Bernard S. Meyerson, Joseph M. Jasinski
Journal of Applied Physics