Joseph M. Jasinski
Journal of Physical Chemistry
Mass spectrometric evidence is presented for the direct formation of gas-phase silyl radical, SiH3, as a product of the heterogeneous etching reaction of silicon films with hydrogen or deuterium atoms. © 1993.
Joseph M. Jasinski
Journal of Physical Chemistry
Jack O. Chu, David B. Beach, et al.
Journal of Physical Chemistry
Joseph M. Jasinski, Joan K. Frisoli, et al.
Faraday Discussions of the Chemical Society
Joseph M. Jasinski, Stephen M. Gates
Accounts of Chemical Research