Conference paper
Post-Si CMOS: III-V n-MOSFETs with high-k gate dielectrics
Yanning Sun, S.J. Koester, et al.
CS MANTECH 2007
We report the fabrication and characterization of high-speed germanium on silicon-on-insulator lateral PIN photodetectors. At an incident wavelength of 850 nm, 10 × 10-μm detectors with finger spacing S of 0.4 μm (0.6 μm) produced a - 3-dB bandwidth of 29 GHz (27 GHz at a bias voltage of - 1 V. The detectors with S = 0.6 μm had external quantum efficiency of 34% at 850 nm and 46% at 900 nm and dark current of 0.02 μA at - 1-V bias. © 2004 IEEE.
Yanning Sun, S.J. Koester, et al.
CS MANTECH 2007
J.A. Kash, C.W. Baks, et al.
LEOS 2003
I. Lagnado, P.R. De La Houssaye, et al.
SiRF 2000
S.J. Koester, K. Ismail, et al.
IEEE Electron Device Letters