Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
The solution of a set of linear equations involving a circulant matrix is easily accomplished with an algorithm based on fast Fourier transforms. The numerical stability of this algorithm is studied. It is shown that the algorithm is weakly stable; i.e., if the circulant matrix is well conditioned, then the computed solution is close to the exact solution. On the other hand, it is shown that the algorithm is not strongly stable - the computed solution is not necessarily the solution of a nearby circular deconvolution problem.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Da-Ke He, Ashish Jagmohan, et al.
ISIT 2007
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
Matthew A Grayson
Journal of Complexity