American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

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01 Aug 1996

Preparation of lithographic resist materials by anionic polymerization

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Aqueous base developable deep uv resist systems based on novel monomeric and polymeric dissolution inhibitors

Hiroshi Ito

Proceedings of SPIE 1989

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Development of new advanced resist materials for microlithography

Hiroshi Ito

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Resist materials

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Thermally Developable, Positive Resist Systems with High Sensitivity

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