P.C. Pattnaik, D.M. Newns
Physical Review B
The utility of near-edge x-ray absorption fine structure (NEXAFS) for providing detailed chemical information about lithographic interfaces, by focusing initially on the T-topping/closure issue and probing the surface and bulk composition of the photo-acid generator in a model resist formulation was demonstrated. In addition, the extent of deprotection at the resist surface was also studied as a function of postexposure bake time using NEXAFS. The resultant data were analyzed in detail.
P.C. Pattnaik, D.M. Newns
Physical Review B
Ellen J. Yoffa, David Adler
Physical Review B
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry