Conference paper
Polysilanes: solution photochemistry and deep UV lithography
R.D. Miller, G.M. Wallraff, et al.
ACS PMSE 1988
We present a method of resolving the nuclear and electronic contributions to the third-order susceptibility χ3 in a phase conjugation experiment. The technique is applied to octylmethylpolysilane yielding χ3 (electronic)=(1.8±0.5)×10-12 esu and χ3(nuclear)=(1.1±0.4) ×10-12 esu at 532 nm.
R.D. Miller, G.M. Wallraff, et al.
ACS PMSE 1988
G.M. Wallraff, W.D. Hinsberg
Chemical Reviews
Hiroshi Ito, H.D. Truong, et al.
J. Photopolym. Sci. Tech.
W.D. Hinsberg, G.M. Wallraff, et al.
American Chemical Society, Polymer Preprints, Division of Polymer Chemistry