PaperCharacteristics of the annealing kinetics of tin films deposited at 88°KJ.R. Priest, C. Chiou, et al.Journal of Applied Physics
PaperEnhancement of transverse thermoelectric voltages in thin metallic filmsR.J. Von Gutfeld, H.L. CaswellApplied Physics Letters
PaperAnnealing of residual stress in silicon monoxide films [1]J.R. Priest, H.L. CaswellBritish Journal of Applied Physics
PaperLow-temperature properties of evaporated lead filmsH.L. Caswell, J.R. Priest, et al.Journal of Applied Physics
