Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Calculations of the multilayer relaxation of several open fcc and bcc surfaces have been carried out with the modified point-ion model that was shown earlier to provide satisfactory agreement with experiment for aluminum and iron. The surfaces considered here are the fcc {211}, {311}, {411}, {511}, and the bcc {210}, {310}, {410}, {510}, which have ordered step structures and different roughnesses. The relaxation values are given both in a surface-adapted coordinate system and in the bulk-crystal coordinate system; they are displayed in the form of step-profile distortions. The general trend confirms the edge-atom depression reported earlier by other authors and reveals an overall smoothing of the step profiles. © 1987 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
K.A. Chao
Physical Review B
R.W. Gammon, E. Courtens, et al.
Physical Review B