Joseph M. Jasinski
Journal of Physical Chemistry
Direct loss measurements for the heterogeneous reaction of the silyl radical, SiH3, obtained in a discharge flow reactor with mass spectrometric detection, are reported. From these measurements and the calculated gas-surface collision frequency, total surface loss coefficients, β, are determined for silyl on two different surfaces, one coated with a growing silicon-containing film and the other coated with Halocarbon wax. © 1993 American Chemical Society.
Joseph M. Jasinski
Journal of Physical Chemistry
Joseph M. Jasinski, Jack O. Chu
The Journal of Chemical Physics
Joseph M. Jasinski, Stephen M. Gates
Accounts of Chemical Research
Joseph M. Jasinski
Chemical Physics Letters