Publications

358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Spin superlattice formation in ZnSe-based diluted magnetic semiconductor heterostructures
- - B.T. Jonker
  - W.C. Chou
  - et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Plasma particulate contamination control. II. Self-cleaning tool design
- - Gary S. Selwyn
  - Edward F. Patterson
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Dopant diffusion in silicides: Effect of diffusion paths
- - Carol Stanis
  - J.M. Cotte
  - et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Scanning tunneling microscopy study of the adsorption and recombinative desorption of hydrogen from the Si(100)-2x 1 surface
- - John J. Boland
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surface analysis studies of copper chemical vapor deposition from 1,5-cyclooctadiene-copper(l)-hexafluoroacetylacetonate
- - Susan L. Cohen
  - Michael Liehr
  - et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Initial stage oxidation of the Ge:Si(111)-(5×5) and Ge:Si(111)-(7X7) surfaces
- - R. Cao
  - F. Bozso
  - et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Enhanced sputtering of one species in the processing of multielement thin films
- - S. Berg
  - C. Nender
  - et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Preparation of low resistivity Cu-1 at. %Cr thin films by magnetron sputtering
- - C. Cabral
  - J.M.E. Harper
  - et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Nucleation and growth of silicon on Si02 during SiH4 low pressure chemical vapor deposition as studied by hydrogen desorption titration
- - M. Liehr
  - S.S. Dana
  - et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Temperature optimization in an azimuthally symmetric single-wafer chemical vapor deposition reactor: The low pressure regime
- - David E. Kotecki
  - Steven G. Barbee
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films