Topology and context-based pattern extraction using line-segment Voronoi diagram
- Sandeep Kumar Dey
- Panagiotis Cheilaris
- et al.
- 2015
- SPIE Advanced Lithography 2015
Publications
24 results at SPIE Advanced Lithography 2015
Inverse lithography using sparse mask representations
- Radu C. Ionescu
- Paul Hurley
- et al.
- 2015
- SPIE Advanced Lithography 2015
Accurate and fast computation of transmission cross coefficients
- Ştefan Apostol
- Paul Hurley
- et al.
- 2015
- SPIE Advanced Lithography 2015
Experiments using automated sample plan selection for OPC modeling
- Ramya Viswanathan
- Om Jaiswal
- et al.
- 2015
- SPIE Advanced Lithography 2015
Forbidden pitches: Causes, source optimization, and their role in design rules
- Ştefan Apostol
- Paul Hurley
- 2015
- SPIE Advanced Lithography 2015
Machine learning and predictive data analytics enabling metrology and process control in IC fabrication
- Narender Rana
- Yunlin Zhang
- et al.
- 2015
- SPIE Advanced Lithography 2015
Towards production ready processing with a state-of-the-art EUV cluster
- Karen Petrillo
- Nicole Saulnier
- et al.
- 2015
- SPIE Advanced Lithography 2015
Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP)
- Yannick Feurprier
- Katie Lutker-Lee
- et al.
- 2015
- SPIE Advanced Lithography 2015
Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry
- Dhairya Dixit
- Samuel O'Mullane
- et al.
- 2015
- SPIE Advanced Lithography 2015
Scatterometry-based defect detection for DSA in-line process control
- Robin Chao
- Chi Chun Liu
- et al.
- 2015
- SPIE Advanced Lithography 2015