Mary A. Breton  Mary A. Breton photo         

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Metrology Engineer
Albany, NY
  +1dash518dash292dash7314

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Professional Associations

Professional Associations:  Society of Women Engineers

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More information:  LinkedIn  |  Google Scholar  |  ResearchGate


2019

Machine learning and hybrid metrology using scatterometry and LE-XRF to detect voids in copper lines
Dexin Kong, Koichi Motoyama, Huai Huang, Brock Mendoza, Mary Breton, Gangadhara R Muthinti, Hosadurga Shobha, John Gaudiello, Aron Cepler, Matthew Sendelbach, Susan Emans, Shay Wolfing, Avron Ger, Kavita Shah
SPIE Advanced Lithography - Metrology, Inspection, and Process Control for Microlithography XXXIII, pp. 109590A, International Society for Optics and Photonics, 2019


2018

Transmission Electron Microscopy Sample Preparation By Design Based Recipe Writing in a DBFIB
J Demarest, B Austin, J Arjavac, M Breton, M Bergendahl, M Biedrzycki, C Boye, J Gaudiello, J Hager, S Matham, K Nguyen, M Persala, S Teehan
ISTFA 2018: Proceedings from the 44th International Symposium for Testing and Failure Analysis, pp. 238, ASM International

In-line characterization of non-selective SiGe nodule defects with scatterometry enabled by machine learning
Dexin Kong, Robinhsinkuo Chao, Mary Breton, Chi-chun Liu, Gangadhara R. Muthinti, Soon-Cheon Seo, Nicolas J. Loubet, Pietro Montanini, John Gaudiello, Veeraraghavan Basker, Aron J. Cepler, Susan Ng-Emans, Matthew Sendelbach, Itzik Kaplan, Gilad Barak, Daniel Schmidt, Julien Frougier
Metrology, Inspection, and Process Control for Microlithography XXXII10585, 2018
Abstract   wafer, spectral line, scanning electron microscope, scaling, process window, materials science, machine learning, field effect transistor, artificial intelligence


2017

Electrical test prediction using hybrid metrology and machine learning
Mary Breton, Robin Chao, Gangadhara Raja Muthinti, Abraham A. de la Pena, Jacques Simon, Aron J. Ceplar, Matthew J. Sendelbach, John Gaudiello, Hao Tang, Susan Emans, Michael Shifrin, Yoav Etzioni, Ronen Urenski, Wei T. Lee
Metrology, Inspection, and Process Control for Microlithography XXXI, SPIE Advanced Lithography, 2017

An OCD perspective of line edge and line width roughness metrology
Ravi K. Bonam, Gangadhara R. Muthinti, Mary Breton, Chi-Chun Liu, Stuart Sieg, Indira Seshadri, Nicole Saulnier, Jeffrey Shearer
Metrology, Inspection, and Process Control for Microlithography XXXI, SPIE Advanced Lithography, 2017

Comprehensive analysis of line-edge and line-width roughness for EUV lithography
Ravi K. Bonam, Chi-Chun Liu, Mary Breton, Stuart Sieg, Indira Seshadri, Nicole Saulnier, Jeffrey Shearer, Gangadhara R. Muthinti, Raghuveer Patlolla, Huai Huang
Extreme Ultraviolet (EUV) Lithography VIII, SPIE Advanced Lithography, 2017


2016

Advanced in-line metrology strategy for self-aligned quadruple patterning
Robin Chao, Mary Breton, Benoit L'Herron, Brock Mendoza, Raja Muthinti, Florence Nelson, Abraham De La Pena, Fee li Le, Eric Miller, Stuart Sieg, James Demarest, Peter Gin, Matthew Wormington, Aron Cepler, Cornel Bozdog, Matthew Sendelbach
Metrology, Inspection, and Process Control for Microlithography XXX, pp. 977813, SPIE Advanced Lithography, 2016

EUV patterning successes and frontiers
Nelson Felix, Dan Corliss, Karen Petrillo, Nicole Saulnier, Yongan Xu, Luciana Meli, Hao Tang, Anuja De Silva, Bassem Hamieh, Martin Burkhardt, Yann Mignot, Richard Johnson, Chris Robinson, Mary Breton, Indira Seshadri, Derren Dunn, Stuart Sieg, & others
Extreme Ultraviolet (EUV) Lithography VII, pp. 97761O--97761O, SPIE Advanced Lithography, 2016


2014

A direct fusion drive for rocket propulsion
Yosef S Razin, Gary Pajer, Mary Breton, Eric Ham, Joseph Mueller, Michael Paluszek, Alan H Glasser, Samuel A Cohen
Acta Astronautica 105(1), 145--155, Elsevier, 2014


2012

Modular aneutronic fusion engine
Yosef Razin, Gary Pajer, Mary Breton, Eric Ham, Joseph Mueller, Michael Paluszek, AH Glasser, Samuel Cohen
Space Propulsion, 2012